CORRECTION FOR CHROMATIC ABERRATION IN MICROSCOPE PROJECTION PHOTOLITHOGRAPHY

被引：9
|
作者：
BRADY, MJ
DAVIDSON, A
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1983年 / 54卷 / 10期
关键词：
D O I：
10.1063/1.1137239
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：1292 / 1295
页数：4
相关论文
共 50 条
  • [1] Lateral chromatic aberration correction for color fringe projection profilometry
    Wang, Dongai
    Kong, Ya
    Gan, Jianwei
    Luo, Han
    Yi, Bingxue
    Chen, Xinyu
    Li, Zhaonan
    Chen, Chao
    [J]. Optical Engineering, 2024, 63 (12)
  • [2] CORRECTION OF CHROMATIC ABERRATION
    KEPRT, J
    [J]. OPTICA ACTA, 1972, 19 (07): : 613 - &
  • [3] ON THE CHROMATIC ABERRATION OF THE MAGNETIC PROJECTION LENS
    MORITO, N
    [J]. JOURNAL OF ELECTRON MICROSCOPY, 1957, 5 : 1 - 2
  • [4] Projection chromatic aberration modeling and correction of phase measurement profilometry based on phase target
    Zhang Y.
    Jia L.
    Gao N.
    Meng Z.
    Zhang Z.
    [J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2023, 52 (08):
  • [5] EXPERIMENTAL INVESTIGATION OF CHROMATIC ABERRATION IN THE ELECTRON MICROSCOPE
    KATAGIRI, S
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1955, 26 (09): : 870 - 873
  • [6] CHROMATIC ABERRATION IN TRANSMISSION ELECTRON-MICROSCOPE
    KAMIYA, Y
    UCHIKAWA, Y
    [J]. JOURNAL OF ELECTRON MICROSCOPY, 1975, 24 (04): : 219 - 226
  • [7] The lateral chromatic aberration of apochromatic microscope systems
    Gardner, IC
    Case, FA
    [J]. BUREAU OF STANDARDS JOURNAL OF RESEARCH, 1931, 6 (4/6): : 937 - 946
  • [8] The lateral chromatic aberration of apochromatic microscope systems
    Gardner, IC
    Case, FA
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1931, 2 (07): : 416 - 428
  • [9] INFLUENCE OF AXIAL CHROMATIC ABERRATION IN PROJECTION PRINTING
    JAIN, PK
    NEUREUTHER, AR
    OLDHAM, WG
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) : 1410 - 1416
  • [10] Teaching optics - On correction of chromatic aberration
    Masajada, J
    Nowak, J
    Zajac, M
    [J]. OPTICA APPLICATA, 1999, 29 (04) : 619 - 631
12345