CORROSION AND ELECTROCHEMICAL-BEHAVIOR OF IN AND IN-BI ALLOYS IN HCL

被引：4

作者：

OKEEFE, TJ

WANG, YM

机构：

[1] UNIV MISSOURI,GRAD CTR MAT RES,ROLLA,MO 65401

[2] GM CORP,RES LABS,WARREN,MI 48090

来源：

CORROSION | 1985年 / 41卷 / 04期

关键词：

D O I：

10.5006/1.3581992

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：205 / 210

页数：6

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