MICROWAVE PLASMA ETCHING

被引：257

作者：

SUZUKI, K ^{[1
]}

OKUDAIRA, S ^{[1
]}

SAKUDO, N ^{[1
]}

KANOMATA, I ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 11期

关键词：

D O I：

10.1143/JJAP.16.1979

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1979 / 1984

页数：6

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