THRESHOLD OF A THALLIUM-IODIDE PHOTO-DISSOCIATION LASER OPERATED AT LOW-PRESSURE

被引：4
|
作者：
HENCHOZ, PD
LUTHY, W
SCHMIELE, R
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 12期
关键词：
D O I：
10.1063/1.330493
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：8451 / 8453
页数：3
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