STUDY OF ANNEALING + OXIDATION OF VERY THIN COPPER DEPOSITS BY ELECTRON DIFFRACTION + ELECTRON MICROSCOPY

被引：0

作者：

UYEDA, N

SIEGEL, BM

SHIN, J

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1964年 / 35卷 / 10期

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D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3085 / &

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