PREPARATION OF SI THIN-FILMS BY SPONTANEOUS CHEMICAL-DEPOSITION

被引：12

作者：

HANNA, J ^{[1
]}

KAMO, A ^{[1
]}

KOMIYA, T ^{[1
]}

SHIMIZU, I ^{[1
]}

KOKADO, H ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,GRAD SCH NAGATSUTA,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 114卷

关键词：

D O I：

10.1016/0022-3093(89)90103-8

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：172 / 174

页数：3

共 50 条

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