RESOLUTION LIMIT OF NEGATIVE ELECTRON RESIST EXPOSED ON A THIN-FILM SUBSTRATE

被引：16
|
作者：
TAMAMURA, T
SUKEGAWA, K
SUGAWARA, S
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期
关键词：
D O I：
10.1149/1.2124303
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1831 / 1835
页数：5
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