TITANIUM SILICIDE FORMATION ON BF2+-IMPLANTED SILICON

被引：29
|
作者：
CHOW, TP
KATZ, W
SMITH, G
机构：
[1] GE, Schenectady, NY, USA, GE, Schenectady, NY, USA
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 01期
关键词：
D O I：
10.1063/1.95844
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
13
引用
收藏
页码：41 / 43
页数：3
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