ELECTRONIC-STRUCTURE OF K/SI(111) INTERFACES

被引:13
|
作者
WEITERING, HH [1 ]
CHEN, J [1 ]
DINARDO, NJ [1 ]
PLUMMER, EW [1 ]
机构
[1] DREXEL UNIV,DEPT PHYS & ATMOSPHER SCI,PHILADELPHIA,PA 19104
关键词
D O I
10.1116/1.578408
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Photoemission studies of the K/Si(111)7 X 7 and K/Si(111) (square-root 3 X square-root 3)R30-degrees-B interfaces show that both interfaces are semiconducting at room temperature saturation coverage. At both types of interfaces, a dispersionless K-induced surface state is observed below the Fermi level. We argue that these interfaces are correlated systems. We provide conclusive evidence that the onset of metallization and long-range conductivity occurs during the development of the second and third layers at cryogenic temperatures.
引用
收藏
页码:2049 / 2053
页数:5
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