EFFECT OF ALKALI-HALIDES ON STRUCTURE OF SPUTTERED SILICON DIOXIDE FILMS

被引：0

作者：

MOLNAR, B ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC

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D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C190 / C190

页数：1

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[1] STRUCTURE OF MOLTEN ALKALI-HALIDES
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