CHARGE MOTION IN SILICON METAL-OXIDE SEMICONDUCTOR STRUCTURES .2.

被引：1

|

作者：

SZABO, R

NEMETHSALLAY, M

SZEP, IC

机构：

来源：

THIN SOLID FILMS | 1982年 / 94卷 / 02期

关键词：

D O I：

10.1016/0040-6090(82)90506-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：143 / 148

页数：6

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