HIGH CONTRAST X-RAY MASK PREPARATION

被引：5
|
作者：
ONO, T
OZAWA, A
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 01期
关键词：
D O I：
10.1116/1.582918
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
12
引用
收藏
页码：68 / 72
页数：5
相关论文
共 50 条
  • [1] Double contrast X-ray mask for high overlay accuracy
    Deguchi, K., 1600, (09): : 1 - 4
  • [2] Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer
    Daiji Noda
    Hiroshi Tsujii
    Naoki Takahashi
    Tadashi Hattori
    Microsystem Technologies, 2010, 16 : 1309 - 1313
  • [3] Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer
    Noda, Daiji
    Tsujii, Hiroshi
    Takahashi, Naoki
    Hattori, Tadashi
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2010, 16 (8-9): : 1309 - 1313
  • [4] High resolution x-ray mask repair
    Blauner, PG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 3070 - 3074
  • [5] CONTRAST OF THE X-RAY MASK FOR SYNCHROTRON RADIATION AND THE CHARACTERISTICS OF REPLICATED PATTERN
    MATSUI, S
    MORIWAKI, K
    HASEGAWA, S
    ARITOME, H
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (06) : 1205 - 1206
  • [6] HIGH-PRECISION X-RAY MASK TECHNOLOGY
    OHKI, S
    YOSHIHARA, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1990, 29 (11): : 2600 - 2604
  • [7] X-RAY MASK REPAIR
    BLAUNER, PG
    MAUER, J
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 421 - 434
  • [8] X-RAY MASK DISTORTIONS
    KARNEZOS, M
    SOLID STATE TECHNOLOGY, 1987, 30 (09) : 151 - 156
  • [9] X-RAY MASK FABRICATION
    BRORS, DL
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 111 - 112
  • [10] X-RAY MASK TECHNOLOGY
    SHIMKUNAS, AR
    HARRELL, SA
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 206 - 212
12345