LITHOGRAPHY BEAMLINE DESIGN AND EXPOSURE UNIFORMITY CONTROLLING AND MEASURING

被引：0
|
作者：
QIAN, SN
JIANG, DK
LIU, ZW
CHEN, QH
KAN, Y
LIU, WP
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1989年 / 60卷 / 07期
关键词：
D O I：
10.1063/1.1140805
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：2148 / 2149
页数：2
相关论文
共 50 条
  • [1] SOR LITHOGRAPHY BEAMLINE
    KANEKO, T
    SAITOH, Y
    ITABASHI, S
    YOSHIHARA, H
    NTT REVIEW, 1990, 2 (04): : 86 - 91
  • [2] Design optimization of synchrotron radiation lithography beamline for a compact storage ring
    Shimano, Hiroki
    Hifumi, Takashi
    Ozaki, Yoshihiko
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1992, 31 (12 B): : 4185 - 4188
  • [3] DESIGN OPTIMIZATION OF SYNCHROTRON RADIATION LITHOGRAPHY BEAMLINE FOR A COMPACT STORAGE RING
    SHIMANO, H
    HIFUMI, T
    OZAKI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (12B): : 4185 - 4188
  • [4] Improvement of dose uniformity in large exposure field for synchrotron radiation lithography
    Maejima, Yukihiko, 1600, (32):
  • [5] Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems
    Wang, Gang
    Li, Zhongliang
    Yuan, Chunxiao
    Zhang, Fang
    CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2023, 50 (13):
  • [6] Design of beamline optics for large-field exposure
    Hasegawa, M
    Gomei, Y
    Hisatsugu, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6845 - 6850
  • [7] Beamline and exposure station for deep x-ray lithography at the advanced photon source
    Lai, B
    Mancini, DC
    Yun, W
    Gluskin, E
    MICROLITHOGRAPHY AND METROLOGY IN MICROMACHINING II, 1996, 2880 : 171 - 176
  • [8] Design of a beamline for soft and deep lithography on third generation synchrotron radiation source
    Di Fabrizio, E
    Nucara, A
    Gentili, M
    Cingolani, R
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (03): : 1605 - 1613
  • [9] IMPROVEMENT OF DOSE UNIFORMITY IN LARGE EXPOSURE FIELD FOR SYNCHROTRON-RADIATION LITHOGRAPHY
    MAEJIMA, Y
    AWAJI, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12A): : 5801 - 5804
  • [10] Effect of Focus Locking Performance of Piezoelectric Ceramics on Exposure Uniformity of Lithography System
    Zheng Jinlun
    Wei Jingsong
    ACTA OPTICA SINICA, 2022, 42 (19)
12345