BORON DOPING OF AMORPHOUS HYDROGENATED SILICON FILMS PREPARED BY RF SPUTTERING

被引：3
|
作者：
JOUSSE, D
SAID, J
BRUYERE, JC
机构：
来源：
THIN SOLID FILMS | 1985年 / 124卷 / 01期
关键词：
D O I：
10.1016/0040-6090(85)90027-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 53
页数：5
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