RESIDUAL PHOTOCURRENT OF AMORPHOUS AS2SE3

被引：5
|
作者：
OHEDA, H [1 ]
NAMIKAWA, H [1 ]
机构：
[1] ELECTROTECH LAB,TANASHI,TOKYO,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1976年 / 15卷 / 08期
关键词：
D O I：
10.1143/JJAP.15.1465
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1465 / 1470
页数：6
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