FLATNESS CHARACTERIZATION OF LARGE DIAMETER SILICON-WAFERS

被引：0

作者：

AMMLUNG, RL ^{[1
]}

机构：

[1] MONSANTO ELECTR MAT CO,ST PETERS,MO 63376

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C106 / C106

页数：1

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[1] INTERFEROMETRIC FLATNESS TESTING OF SILICON-WAFERS
FEITSCHER, R
FRITZ, H
KORNER, K
[J]. FRINGE 89: PROCEEDINGS OF THE 1ST INTERNATIONAL WORKSHOP ON AUTOMATIC PROCESSING OF FRINGE PATTERNS, 1989, 10 : 57 - 61
[2] TECHNICAL TRENDS IN LARGE DIAMETER SILICON-WAFERS .1.
WATANABE, M
[J]. SOLID STATE TECHNOLOGY, 1991, 34 (03) : 69 - 73
[3] TECHNICAL TRENDS IN LARGE DIAMETER SILICON-WAFERS .2.
WATANABE, M
[J]. SOLID STATE TECHNOLOGY, 1991, 34 (04) : 133 - 142
[4] THERMAL WARPAGE OF LARGE DIAMETER CZOCHRALSKI-GROWN SILICON-WAFERS
SHIMIZU, H
AOSHIMA, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1988, 27 (12): : 2315 - 2323
[5] STRUCTURAL CHARACTERIZATION OF PROCESSED SILICON-WAFERS
FEJES, PL
LIAW, HM
DARAGONA, FS
[J]. IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1983, 6 (03): : 314 - 322
[6] SILICON-WAFERS
VANHOY, GA
[J]. MACHINE DESIGN, 1994, 66 (20) : 139 - 139
[7] NONLINEAR RECOMBINATIONS IN PHOTOREFLECTANCE CHARACTERIZATION OF SILICON-WAFERS
FORGET, BC
FOURNIER, D
GUSEV, VE
[J]. APPLIED SURFACE SCIENCE, 1993, 63 (1-4) : 255 - 259
[8] DOUBLE SIDED FREE POLISHING FOR LARGE SILICON-WAFERS
KINOSHITA, M
MINAMIYAMA, T
MORISHITA, S
EBATA, Y
[J]. BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, 1983, 17 (02): : 131 - 132
[9] FRACTURE OF SILICON-WAFERS
MCLAUGHLIN, JC
WILLOUGHBY, AFW
[J]. JOURNAL OF CRYSTAL GROWTH, 1987, 85 (1-2) : 83 - 90
[10] WARPAGE OF SILICON-WAFERS
LEROY, B
PLOUGONVEN, C
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (04) : 961 - 970

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