SOLVENT-DEPENDENT PHOTOPHYSICS OF INDOLOQUINOXALINE

被引：13
|
作者：
WALUK, J
KOMOROWSKI, SJ
机构：
来源：
JOURNAL OF MOLECULAR STRUCTURE | 1986年 / 142卷
关键词：
D O I：
10.1016/0022-2860(86)85086-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：159 / 162
页数：4
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