PULSED ELECTROMAGNETIC INDUCTIVE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION OF AMORPHOUS-CARBON FILMS

被引：4

|

作者：

EBIHARA, K

KANAZAWA, S

YAMAGATA, Y

MAEDA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 03期

关键词：

D O I：

10.1063/1.341816

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1440 / 1445

页数：6

相关论文

共 50 条

[1] HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION
CHOU, LH
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (05) : 2027 - 2035
[2] Plasma-enhanced chemical-vapor deposition of titanium aluminum carbonitride/amorphous-carbon nanocomposite thin films
Shieh, J
Hon, MH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (01): : 87 - 92
[3] AMORPHOUS-CARBON FILMS AS PLANARIZATION LAYERS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
PANG, SW
HORN, MW
[J]. IEEE ELECTRON DEVICE LETTERS, 1990, 11 (09) : 391 - 393
[4] REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION OF EPITAXIAL GE FILMS
RUDDER, RA
FOUNTAIN, GG
MARKUNAS, RJ
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (10) : 3519 - 3522
[5] Modeling catalyst nucleation for carbon nanotube growth by chemical-vapor and plasma-enhanced chemical-vapor deposition methods
Yaser Abdi
Shamsoddin Mohajerzadeh
Arzi Ezatollah
[J]. Journal of Nanoparticle Research, 2010, 12 : 521 - 528
[6] Modeling catalyst nucleation for carbon nanotube growth by chemical-vapor and plasma-enhanced chemical-vapor deposition methods
Abdi, Yaser
Mohajerzadeh, Shamsoddin
Arzi, Ezatollah
[J]. JOURNAL OF NANOPARTICLE RESEARCH, 2010, 12 (02) : 521 - 528
[7] ON THE MICROSTRUCTURAL, OPTICAL, AND THERMAL-PROPERTIES OF HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
CHOU, LH
WANG, HW
[J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (07) : 4673 - 4680
[8] Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition
Merkulov, VI
Melechko, AV
Guillorn, MA
Lowndes, DH
Simpson, ML
[J]. APPLIED PHYSICS LETTERS, 2001, 79 (18) : 2970 - 2972
[9] PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS SE FILMS
NAGELS, P
SLEECKX, E
CALLAERTS, R
[J]. JOURNAL DE PHYSIQUE IV, 1995, 5 (C5): : 1109 - 1115
[10] Plasma treatment effects on hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition
Wu, Jun
Wang, Ying-Lang
Kuo, Cheng-Tzu
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2008, 69 (2-3) : 505 - 508

← 1 2 3 4 5 →