ARSENIC DIFFUSION AND PRECIPITATION AT ASSG/SI INTERFACE

被引：0
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作者：
TSUNASHIMA, Y
KASHIO, T
KAWAGUCHI, H
ONGA, S
YAMABE, K
机构：
来源：
CHARACTERIZATION OF THE STRUCTURE AND CHEMISTRY OF DEFECTS IN MATERIALS | 1989年 / 138卷
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T [工业技术];
学科分类号：
08 ;
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页码：569 / 574
页数：6
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