A DYNAMIC Z-PINCH AS A SOURCE OF INTENSE EXTREME-ULTRAVIOLET RADIATION

被引:3
|
作者
MEHLING, A
BOSS, T
METZNER, J
LANGHOFF, H
机构
[1] Physikalisches Institut, Universität Würzburg
关键词
D O I
10.1063/1.357121
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to heat gases with a dynamic z-pinch a simple apparatus was developed which operates with current pulses of up to 80 kA. Energy of about 10 J/pulse is deposited in the gas. During the pinch the plasma cylinder is compressed from an initial radius of 7.6 mm to 650 mum. Experiments with gases of low atomic number Z yield strong fluorescence in the vacuum and extreme ultraviolet region due to the production of highly ionized species. With acetylene C2H2 an ion concentration of 5 x 10(17) cm-3 (dominated by hydrogen-like carbon ions) was, achieved.
引用
收藏
页码:154 / 158
页数:5
相关论文
共 50 条
  • [1] Power scaling of a Z-pinch extreme ultraviolet source
    McGeoch, MW
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 861 - 866
  • [2] High power extreme ultraviolet source based on a Z-pinch
    McGeoch, MW
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 697 - 701
  • [3] Laser triggered Z-pinch broadband extreme ultraviolet source for metrology
    Tobin, I.
    Juschkin, L.
    Sidelnikov, Y.
    O'Reilly, F.
    Sheridan, P.
    Sokell, E.
    Lunney, J. G.
    [J]. APPLIED PHYSICS LETTERS, 2013, 102 (20)
  • [4] Compact intense extreme-ultraviolet source
    Major, B.
    Ghafur, O.
    Kovacs, K.
    Varju, K.
    Tosa, V
    Vrakking, M. J. J.
    Schuette, B.
    [J]. OPTICA, 2021, 8 (07): : 960 - 965
  • [5] The optimization of the continuum radiation emitted by an intense Z-pinch light source
    Sandolache, G
    Zoita, V
    Fleurier, C
    Bauchire, JM
    Hong, D
    Le Menn, E
    Sarroukh, O
    [J]. CZECHOSLOVAK JOURNAL OF PHYSICS, 2002, 52 : 151 - 155
  • [6] Ion debris characterization from a z-pinch extreme ultraviolet light source
    Antonsen, EL
    Thompson, KC
    Hendricks, MR
    Alman, DA
    Jurczyk, BE
    Ruzic, DN
    [J]. JOURNAL OF APPLIED PHYSICS, 2006, 99 (06)
  • [7] Extreme ultraviolet light emission from Z-pinch discharge plasma source
    Watanabe, M
    Song, I
    Sakamoto, T
    Kobayashi, Y
    Okino, A
    Mohanty, SR
    Horioka, K
    Hotta, E
    [J]. DENSE Z-PINCHES, 2006, 808 : 267 - +
  • [8] Ion debris characterization from a z-pinch extreme ultraviolet light source
    Antonsen, Erik L.
    Thompson, Keith C.
    Hendricks, Matthew R.
    Alman, Darren A.
    Jurczyk, Brian E.
    Ruzic, D.N.
    [J]. Journal of Applied Physics, 2006, 99 (06):
  • [9] Extreme ultraviolet radiation from Z-pinch plasmas for next generation lithography
    Akiyama, H.
    Katsuki, S.
    Namihira, T.
    Sakugawa, T.
    Imamura, H.
    [J]. PROCEEDINGS OF THE 27TH INTERNATIONAL POWER MODULATOR SYMPOSIUM AND 2006 HIGH VOLTAGE WORKSHOPS, 2006, : 356 - +
  • [10] Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography
    McGeoch, M
    [J]. APPLIED OPTICS, 1998, 37 (09): : 1651 - 1658