AR INCORPORATION IN EPITAXIAL TIN FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING IN MIXED AR/N2 DISCHARGES

被引：34
|
作者：
HULTMAN, L [1 ]
JOHANSSON, BO [1 ]
SUNDGREN, JE [1 ]
MARKERT, LC [1 ]
GREENE, JE [1 ]
机构：
[1] UNIV ILLINOIS,DEPT MAT SCI & ENGN,URBANA,IL 61801
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 13期
关键词：
D O I：
10.1063/1.100014
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1175 / 1177
页数：3
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