THE SIGNIFICANCE OF REACTIVE IONS AND REACTIVE NEUTRALS IN ION-BEAM-ASSISTED ETCHING

被引：15
|
作者：
CHINN, JD [1 ]
WOLF, ED [1 ]
机构：
[1] CORNELL UNIV,SCH ELECT ENGN,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词：
ION-BEAM-ASSISTED ETCHING - REACTIVE IONS - REACTIVE NEUTRALS;
D O I：
10.1116/1.583275
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：410 / 415
页数：6
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