THE DEPENDENCE OF RECOMBINATION KINETICS ON PHOTOEXCITATION DENSITY IN A-SI-H

被引:2
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作者
WAKE, DR
AMER, NM
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D O I
10.1016/0022-3093(83)90602-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:389 / 391
页数:3
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