CHARACTERISTICS OF BCL ION-IMPLANTED SILICON

被引：0

作者：

DELFINO, M ^{[1
]}

LUNNON, ME ^{[1
]}

机构：

[1] PHILIPS RES LABS,SUNNYVALE,CA 94088

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 11期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C470 / C470

页数：1

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