STABILIZATION OF TETRAGONAL ZRO2 WITH AL2O3 IN REACTIVE MAGNETRON SPUTTERED THIN-FILMS

被引：24
|
作者：
GILMORE, CM [1 ]
QUINN, C [1 ]
QADRI, SB [1 ]
GOSSETT, CR [1 ]
SKELTON, EF [1 ]
机构：
[1] USN,RES LAB,DIV CONDENSED MATTER & RADIAT SCI,WASHINGTON,DC 20375
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词：
D O I：
10.1116/1.574925
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2085 / 2087
页数：3
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