FORMATION AND STRUCTURE OF EPITAXIAL NICKEL SILICIDE ON SI(111)

被引：55
|
作者：
YANG, WS
JONA, F
MARCUS, PM
机构：
[1] SUNY STONY BROOK,DEPT MAT SCI,STONY BROOK,NY 11794
[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
PHYSICAL REVIEW B | 1983年 / 28卷 / 12期
关键词：
D O I：
10.1103/PhysRevB.28.7377
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：7377 / 7380
页数：4
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