PLASMA ANODIC-OXIDATION OF INP

被引：6

|

作者：

FUYUKI, T

MORIUCHI, S

MATSUNAMI, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1983年 / 22卷 / 10期

关键词：

D O I：

10.1143/JJAP.22.1574

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1574 / 1576

页数：3

相关论文

共 50 条

[1] ANODIC-OXIDATION OF INP IN PURE WATER
ROBACH, Y
JOSEPH, J
BERGIGNAT, E
HOLLINGER, G
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (10) : 2957 - 2959
[2] INP MIS DIODES PREPARED BY ANODIC-OXIDATION
OTA, T
HORIKOSHI, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (05) : 989 - 990
[3] ANODIC-OXIDATION OF INP USING A CITRIC ACID BASED SOLUTION
FRANZ, G
[J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (02) : 500 - 505
[4] SELECTIVE ANODIC-OXIDATION OF SILICON IN OXYGEN PLASMA
HO, VQ
SUGANO, T
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1436 - 1443
[5] SELECTIVE ANODIC-OXIDATION OF SILICON IN OXYGEN PLASMA
HO, VQ
SUGANO, T
[J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1980, 15 (04) : 501 - 508
[6] ANODIC-OXIDATION OF SI IN OXYGEN CHLORINE PLASMA
HANEJI, N
ARAI, F
ASADA, K
SUGANO, T
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) : 100 - 105
[7] ANODIC-OXIDATION OF GAAS USING OXYGEN PLASMA
YAMASAKI, K
SUGANO, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 : 321 - 326
[8] ANODIC-OXIDATION OF SI IN OXYGEN CHLORINE PLASMA
HANEJI, N
ARAI, F
ASADA, K
SUGANO, T
[J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1985, 20 (01) : 20 - 25
[9] EFFECTS OF IMPLANTATION AND ANNEALING ON ANODIC-OXIDATION OF SEMI-INSULATING INP
BESLAND, MP
PERROSSIER, JL
ROBACH, Y
THOMAS, I
KRAWCZYK, S
TARDY, J
DUPIN, JP
[J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1990, 45 (251): : 71 - 73
[10] ANODIC-OXIDATION OF GAAS IN THE OXYGEN PLASMA OF THE HF DISCHARGE
PINCIK, E
THURZO, I
BARTOS, J
DILINGER, J
KUTIK, P
[J]. ACTA PHYSICA SLOVACA, 1985, 35 (02) : 123 - 130

← 1 2 3 4 5 →