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THERMALLY ACTIVATED CONDUCTIVITY OF HYDROGENATED AMORPHOUS-CARBON FILMS INDUCED BY ARGON PLASMA BOMBARDMENT (VOL 32, PG L 539, 1993)
被引:0
|
作者
:
CHOU, LH
论文数:
0
引用数:
0
h-index:
0
CHOU, LH
HSIEH, WT
论文数:
0
引用数:
0
h-index:
0
HSIEH, WT
WU, PW
论文数:
0
引用数:
0
h-index:
0
WU, PW
机构
:
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
|
1993年
/ 32卷
/ 7A期
关键词
:
D O I
:
暂无
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
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页码:L966 / L966
页数:1
相关论文
共 2 条
[1]
THERMALLY ACTIVATED CONDUCTIVITY OF HYDROGENATED AMORPHOUS-CARBON FILMS INDUCED BY ARGON PLASMA BOMBARDMENT
CHOU, LH
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
CHOU, LH
HSIEH, WT
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
HSIEH, WT
WU, PW
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
WU, PW
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1993,
32
(4A):
: L539
-
L542
[2]
EFFECTS OF ARGON ION-BOMBARDMENT ON THE MICROSTRUCTURES AND ELECTRICAL CONDUCTIVITIES OF HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
CHOU, LH
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
CHOU, LH
HSIEH, WT
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
HSIEH, WT
[J].
JOURNAL OF APPLIED PHYSICS,
1994,
75
(04)
: 2257
-
2263
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