INSTABILITY OF THE ELECTRON-HOLE PLASMA IN SILICON - COMMENT

被引：2
|
作者：
BOCKING, VR [1 ]
JOHNSTONE, ES [1 ]
VANDRIEL, HM [1 ]
机构：
[1] UNIV TORONTO,ERINDALE COLL,MISSISSAUGA L5L 1C6,ONTARIO,CANADA
来源：
PHYSICAL REVIEW LETTERS | 1986年 / 56卷 / 02期
关键词：
D O I：
10.1103/PhysRevLett.56.205
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：205 / 205
页数：1
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