Neutral and metallic vs. charged and semiconducting surface layer in acceptor doped CeO2

被引:0
|
作者
Ilan Riess
机构
[1] Technion IIT
[2] Physics Department
关键词
D O I
暂无
中图分类号
TQ133.3 [镧系元素(稀土元素)的无机化合物];
学科分类号
摘要
The monomolecular surface layer of acceptor doped CeO2may become neutral and metallic or charged and semiconducting.This is revealed in the theoretical analysis of the oxygen pressure dependence of the surface defects concentration in acceptor doped ceria with two different dopant types and operated under different oxygen pressures. Recently published experimental data for highly reduced Sm0.2Ce0.8O1.9–x(SDC) containing a fixed valence dopant Sm3+are very different from those published for Pr0.1Ce0.9O2–x(PCO) with the variable valence dopant Pr4+/Pr3+being reduced under milder conditions. The theoretical analysis of these experimental results fits very well the experimental results of SDC and PCO. It leads to the following predictions: the highly reduced surface of SDC is metallic and neutral, the metallic surface electron density of state is gs= 0.9 × 1038J-1·m-2(1.4 × 1015eV-1·cm-2), the electron effective mass is meff,s=3.3me, and the phase diagram of the reduced surface has the α(fcc) structure as in the bulk. In PCO a double layer is predicted to be formed between the surface and the bulk with the surface being negatively charged and semiconducting. The surface of PCO maintains high Pr3+defect concentration as well as relative high oxygen vacancy concentration at oxygen pressures higher than in the bulk. The reasons for the difference between a metallic and semiconducting surface layer of acceptor doped CeO2are reviewed, as well as the key theoretical considerations applied in coping with this problem. For that we make use of the experimental data and theoretical analysis available for acceptor doped ceria.
引用
收藏
页码:795 / 802
页数:8
相关论文
共 50 条
  • [1] Neutral and metallic vs. charged and semiconducting surface layer in acceptor doped CeO2
    Riess, Ilan
    INTERNATIONAL JOURNAL OF MINERALS METALLURGY AND MATERIALS, 2024, 31 (04) : 795 - 802
  • [2] Surface potentials of acceptor- and donor-doped CeO2 thin films and their relation to oxygen surface exchange
    Wardenga, Hans F.
    Schuldt, Katharina N. S.
    Waldow, Stephan
    De Souza, Roger A.
    Klein, Andreas
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2022, 24 (02) : 1072 - 1080
  • [3] Atomic layer reversal on CeO2 (100) surface
    Huang, Jinglu
    Yu, Yunbo
    Zhu, Jing
    Yu, Rong
    SCIENCE CHINA-MATERIALS, 2017, 60 (09) : 903 - 908
  • [4] Oxygen permeation properties and surface modification of acceptor-doped CeO2/MnFe2O4 composites
    Hitoshi Takamura
    Hiroshi Sugai
    Masato Watanabe
    Takehiro Kasahara
    Atsunori Kamegawa
    Masuo Okada
    Journal of Electroceramics, 2006, 17 : 741 - 748
  • [5] Oxygen permeation properties and surface modification of acceptor-doped CeO2/MnFe2O4 composites
    Takamura, Hitoshi
    Sugai, Hiroshi
    Watanabe, Masato
    Kasahara, Takehiro
    Kamegawa, Atsunori
    Okada, Masuo
    JOURNAL OF ELECTROCERAMICS, 2006, 17 (2-4) : 741 - 748
  • [6] Study of Ta-doped CeO2 Buffer Layer for Coated Conductors
    Liu Min
    Lu Zhao
    Xu Yan
    Ye Shuai
    Suo Hongli
    RARE METAL MATERIALS AND ENGINEERING, 2014, 43 (06) : 1329 - 1331
  • [7] Dissociative adsorption of methane on the Cu and Zn doped (111) surface of CeO2
    Carey, John J.
    Nolan, Michael
    APPLIED CATALYSIS B-ENVIRONMENTAL, 2016, 197 : 324 - 336
  • [8] Aqueous and Surface Chemistries of Photocatalytic Fe-Doped CeO2 Nanoparticles
    Channei, Duangdao
    Phanichphant, Sukon
    Nakaruk, Auppatham
    Mofarah, Sajjad S.
    Koshy, Pramod
    Sorrell, Charles C.
    CATALYSTS, 2017, 7 (02):
  • [9] Growth of doped lanthanum manganite thin films on CeO2 buffer layer and their properties
    Shmatok, A
    Mukovskii, Y
    Marchenko, V
    Bdikin, I
    Vasiliev, A
    JOURNAL OF ALLOYS AND COMPOUNDS, 2001, 326 (1-2) : 303 - 308
  • [10] Ab initio studies of half-metallic ferromagnetism in carbon-doped CeO2
    Xiao, Wen-Zhi
    Wang, Ling-Ling
    Xu, Liang
    Wan, Qing
    Pan, An-Lian
    SOLID STATE COMMUNICATIONS, 2010, 150 (19-20) : 923 - 927