Relationship between chemical degradation and thickness loss of an amine-cured epoxy coating exposed to different UV environments

被引:0
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作者
Aziz Rezig
Tinh Nguyen
David Martin
Lipiin Sung
Xiaohong Gu
Joan Jasmin
Jonathan W. Martin
机构
[1] National Institute of Standards and Technology,
关键词
Atomic force microscopy; FTIR; ATR; photodegradation; durability; service life prediction; architectural; Weatherability; epoxy resins; epoxy; thermoset;
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摘要
The relationship between chemical degradation and thickness loss of an unpigmented, non UV-stabilized, crosslinked amine-cured epoxy coating exposed to three UV conditions was investigated. Spin-coated samples having a thickness of approximately 7 μm on an Si substrate were prepared from a stochiometric mixture of a bisphenol A epoxy resin and a tetra-functional amine curing agent. Samples were exposed outdoors and to two accelerated laboratory UV environments. Chemical degradation and thickness loss were measured by transmission Fourier transform infrared spectroscopy (FTIRS) and laser scanning confocal microscopy (LSCM), respectively. In addition, surface roughness and morphological changes were measured by atomic forcemicrosocopy (AFM) and LSCM. Substantial chemical degradation, thickness loss, and morpholocal changes occurred in the exposed films, and the rate of chemical degradation was greater than that due to the thickness loss. This additional chemical loss was attributed to an inhomogeneous degradation process in which nanoscale localized depressions initiate at certain sites on the surface, which then enlarge and deepen with exposure time. The results of this study provide a better understanding of the degradation mechanism and should lead to the development of scientific-based models for predicting the service life of crosslinked amine-cured epoxy coatings.
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页码:173 / 184
页数:11
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