Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

被引：0
|
作者：
Soham Das
Spandan Guha
Ranjan Ghadai
Dhruva Kumar
Bibhu P. Swain
机构：
[1] Sikkim Manipal Institute of Technology,Department of Mechanical Engineering
[2] Sikkim Manipal Institute of Technology,Nano
来源：
Applied Physics A | 2017年 / 123卷
关键词：
Plasticity Index; Phonon Band; TiAlN Coating; Transverse Optic; Transverse Acoustic;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.
引用
收藏
相关论文
共 50 条
  • [1] Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films
    Das, Soham
    Guha, Spandan
    Ghadai, Ranjan
    Kumar, Dhruva
    Swain, Bibhu P.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (06):
  • [2] Structural and mechanical properties of titanium-aluminium-nitride films deposited by reactive close-field unbalanced magnetron sputtering
    Shum, PW
    Li, KY
    Zhou, ZF
    Shen, YG
    SURFACE & COATINGS TECHNOLOGY, 2004, 185 (2-3): : 245 - 253
  • [3] Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAlN Coatings
    Soham Das
    Ranjan Ghadai
    Spandan Guha
    Ashis Sharma
    Bibhu P. Swain
    Arabian Journal for Science and Engineering, 2020, 45 : 967 - 975
  • [4] Investigation of mechanical properties of CVD grown titanium silicon nitride thin films under reduced atmosphere
    Spandan Guha
    Soham Das
    Asish Bandyopadhyay
    Santanu Das
    Bibhu P. Swain
    Applied Physics A, 2018, 124
  • [5] Investigation of mechanical properties of CVD grown titanium silicon nitride thin films under reduced atmosphere
    Guha, Spandan
    Das, Soham
    Bandyopadhyay, Asish
    Das, Santanu
    Swain, Bibhu P.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2018, 124 (01):
  • [6] Investigation of structural network and mechanical properties of Titanium silicon nitride (TiSiN) thin films
    Guha, Spandan
    Das, Soham
    Bandyopadhyay, Asish
    Das, Santanu
    Swain, Bibhu P.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2018, 731 : 347 - 353
  • [7] Structural, morphological and mechanical hardness properties of titanium nitride thin films deposited by DC magnetron sputtering: Effect of substrate temperature
    Hosseinnejad, M. T.
    Ettehadi-Abari, M.
    Panahi, N.
    Zadeh, M. A. Ferdosi
    Case, S. W.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2017, 19 (5-6): : 434 - 439
  • [8] STRUCTURAL AND MECHANICAL PROPERTIES OF TiAlN AND TiAlN GRADIENT FILMS DEPOSITED BY REACTIVE PULSED DC MAGNETRON SPUTTERING
    Aiempanakit, Montri
    Rukkun, Jariyaporn
    Reakaukot, Pimchanok
    Wongpisan, Witthawat
    Waree, Kirati
    Aiempanakit, Kamon
    SURANAREE JOURNAL OF SCIENCE AND TECHNOLOGY, 2023, 30 (02):
  • [9] Properties and preparation conditions of carbon nitride thin films deposited by laser CVD
    Falk, F.
    Meinschien, J.
    Schuster, K.
    Stafast, H.
    Carbon, 36 (5-6): : 765 - 769
  • [10] Properties and preparation conditions of carbon nitride thin films deposited by laser CVD
    Falk, F
    Meinschien, J
    Schuster, K
    Stafast, H
    CARBON, 1998, 36 (5-6) : 765 - 769
12345