Microstructure and composition of silicon carbide films deposited on carbon fibers by chemical vapor deposition

被引：0
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作者：
D. Dietrich
H. Podlesak
G. Marx
B. Wielage
机构：
[1] Professur Physikalische Chemie,
[2] Technische Universität,undefined
[3] D-09107 Chemnitz,undefined
[4] Germany,undefined
[5] Professur Verbundwerkstoffe,undefined
[6] Technische Universität,undefined
[7] D-09107 Chemnitz,undefined
[8] Germany,undefined
来源：
Fresenius' Journal of Analytical Chemistry | 1998年 / 361卷
关键词：
Microstructure; Transmission Electron Microscopy; Carbide; Hexagonal; Chemical Vapor Deposition;
D O I：
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学科分类号：
摘要：
The microstructure and the composition of CVD silicon carbide films used as fiber coatings in composite materials were investigated by photoelectron spectroscopy and transmission electron microscopy. The films with a uniform thickness of 50 nm consisted of small SiC grains with a mean diameter of 15 nm and showed a stripe contrast in bright field images. Large grains with diameters in the dimension of the film thickness were used for imaging the lattice structure by high-resolution electron microscopy. The results are discussed as a polytype of cubic lamellae of a few nanometers and intermediate random stacking sequences of hexagonal structure.
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页码：568 / 569
页数：1
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