No-Load Control Method of LLC Resonant Converter for Plasma Sputtering Process Using Full-Bridge Structure

被引:0
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作者
Min-Jun Kwon
Woo-Cheol Lee
机构
[1] Hankyong National University,Department of Electrical, Electronic and Control Engineering, Institute for Information Technology Convergence
关键词
LLC resonant converter; Plasma process; Full-bridge; No-load condition;
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学科分类号
摘要
This paper describes a no-load control method of an LLC resonant converter for a plasma sputtering process using a full-bridge structure. Initially, the plasma sputtering process needs to operate under a no-load condition to produce a plasma. The operation characteristics of an LLC resonant converter obtained by the conventional analysis are different from the actual no-load condition. Therefore, the no-load characteristics of an LLC resonant converter must be analyzed and the control method of the no-load condition must be studied. In this paper, the no-load characteristic of an LLC resonant converter was analyzed considering the parasitic component. It also described a method for controlling an LLC resonant converter via the full-bridge structure in a no-load condition. The analysis and control operation were confirmed through simulation and experiment.
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页码:795 / 803
页数:8
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