Enhanced ablation of silica by the superposition of femtosecond and nanosecond laser pulses

被引：0
|
作者：
F. Théberge
S.L. Chin
机构：
[1] Laval University,Centre d’Optique, Photonique et Laser
来源：
Applied Physics A | 2005年 / 80卷
关键词：
Thin Film; SiO2; Laser Pulse; Operating Procedure; Electronic Material;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
We investigate the ablation process in SiO2 by the superposition of 180 fs laser pulse (λcenter=800 nm) with a 15 ns laser pulse (λcenter=532 nm). Compared to femtosecond laser pulses alone, we measured an increase of 270±30% in volume of the ejected material with only a total increase of 40% of lasers fluences. This increase of ablation is the result of thermal and incubation effects generated by the femtosecond laser pulse.
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页码：1505 / 1510
页数：5
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