Direct measurement of the propagation velocity of defects using coherent X-rays

被引:0
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作者
Ulbrandt J.G. [1 ]
Rainville M.G. [2 ]
Wagenbach C. [2 ]
Narayanan S. [3 ]
Sandy A.R. [3 ]
Zhou H. [3 ]
Ludwig K.F., Jr. [2 ,4 ]
Headrick R.L. [1 ]
机构
[1] Department of Physics and Materials Science Program, University of Vermont, Burlington, 05405, VT
[2] Division of Materials Science and Engineering, Boston University, Boston, 02215, MA
[3] Advanced Photon Source, Argonne National Lab, Argonne, 60439, IL
[4] Department of Physics, Boston University, Boston, 02215, MA
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10.1038/nphys3708
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摘要
The properties of artificially grown thin films are often strongly affected by the dynamic relationships between surface growth processes and subsurface structure. Coherent mixing of X-ray signals promises to provide an approach to better understand such processes. Here, we demonstrate the continuously variable mixing of surface and bulk scattering signals during real-time studies of sputter deposition of a-Si and a-WSi2 films by controlling the X-ray penetration and escape depths in coherent grazing-incidence small-angle X-ray scattering. Under conditions where the X-ray signal comes from both the growth surface and the thin film bulk, oscillations in temporal correlations arise from coherent interference between scattering from stationary bulk features and from the advancing surface. We also observe evidence that elongated bulk features propagate upwards at the same velocity as the surface. Furthermore, a highly surface-sensitive mode is demonstrated that can access the surface dynamics independently of the subsurface structure. © 2016 Macmillan Publishers Limited. All rights reserved.
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页码:794 / 799
页数:5
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