Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer

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作者
Hyunsu Kim
Jin-Seo Noh
Jong Wook Roh
Dong Won Chun
Sungman Kim
Sang Hyun Jung
Ho Kwan Kang
Won Yong Jeong
Wooyoung Lee
机构
[1] Yonsei University,Department of Materials Science and Engineering
[2] Korea Institute of Science and Technology (KIST),Nano Process Division
[3] Korea Advanced Nano Fab. Center,undefined
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关键词
FePt; CrV underlayer; Patterned media; E-beam lithography;
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摘要
A thin FePt film was deposited onto a CrV seed layer at 400°C and showed a high coercivity (~3,400 Oe) and high magnetization (900–1,000 emu/cm3) characteristic of L 10 phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion bombardment. We employed a deposition-last process, in which FePt film deposited at room temperature underwent lift-off and post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that ultra-high-density magnetic recording media can be achieved using this optimized top-down approach.
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