Pulsed laser ablation deposition of thin films on large substrates

被引：0
|
作者：
S. Acquaviva
M. Fernández
G. Leggieri
A. Luches
M. Martino
A. Perrone
机构：
[1] Istituto Nazionale Fisica della Materia and University of Lecce,
[2] Department of Physics,undefined
[3] 73100 Lecce,undefined
[4] Italy (Fax: +39-0832/320-505,undefined
[5] E-mail: luches@le.infn.it),undefined
来源：
Applied Physics A | 1999年 / 69卷
关键词：
PACS: 81.15.Fg; 67.70; 81.05.Je;
D O I：
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学科分类号：
摘要：
We have designed and built an ultra-high vacuum chamber which allows thin film deposition on large area (up to 100 mm diameter) flat substrates and on three-dimensional substrates (e.g. 100 mm long, 50 mm diameter cylinders) by the pulsed laser deposition and reactive pulsed laser deposition techniques. Heating of substrates during and after film deposition is possible using either resistive heaters or a lamp array. Metal (Cu) and metal nitride (TiN) and carbide (TiC) films were deposited on Si wafers (60 and 100 mm diameter), three-dimensional steel substrates (steel cylinders and screws), Teflon plates, and paper sheets.
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页码：S471 / S474
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