Investigation of dielectric properties of cold C3F8 mixtures and hot C3F8 gas as Substitutes for SF6

被引:0
|
作者
Xiaohua Wang
Linlin Zhong
Jing Yan
Aijun Yang
Guohui Han
Guiquan Han
Yi Wu
Mingzhe Rong
机构
[1] Xi’an Jiaotong University,State Key Laboratory of Electrical Insulation and Power Equipment
[2] Pinggao Group Co. Ltd.,undefined
来源
关键词
Plasma Physics;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Investigation of dielectric properties of cold C3F8 mixtures and hot C3F8 gas as Substitutes for SF6
    Wang, Xiaohua
    Zhong, Linlin
    Yan, Jing
    Yang, Aijun
    Han, Guohui
    Han, Guiquan
    Wu, Yi
    Rong, Mingzhe
    EUROPEAN PHYSICAL JOURNAL D, 2015, 69 (10):
  • [2] DC BREAKDOWN OF C3F8/AR AND C3F8/N2 MIXTURES
    KUNHARDT, EE
    SUTTON, C
    DANNER, D
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1984, 12 (03) : 232 - 233
  • [3] The effect of air, SF6 and C3F8 on human corneal endothelial cells
    Fuest, Matthias
    Plange, Niklas
    Johnen, Sandra
    Kuerten, David
    Walter, Peter
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 2016, 57 (12)
  • [4] SULFURHEXAFLUORIDE (SF6) VERSUS PERFLUOROPROPANE (C3F8) GAS AS TAMPONADE IN MACULAR HOLE SURGERY
    Modi, Aditya
    Giridhar, Anantharaman
    Gopalakrishnan, Mahesh
    RETINA-THE JOURNAL OF RETINAL AND VITREOUS DISEASES, 2017, 37 (02): : 283 - 290
  • [5] Comparison of 20% SF6 and 6% C3F8 Gas for Anterior Chamber Tamponade in Endothelial Keratoplasty
    Wiley, Zachary C.
    Huang, Xiaofan
    Staggers, Kristen A.
    Hamill, M. Bowes
    CORNEA, 2024, 43 (10) : 1238 - 1244
  • [6] Dielectric Properties of Gas Mixtures with C3F8/C2F6 and N2/CO2
    Okabe, Shigemitsu
    Wada, Junichi
    Ueta, Genyo
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2015, 22 (04) : 2108 - 2116
  • [7] Outcomes of the Surgical Repair of Macular Hole Comparing SF6 to C3F8 or C2F6
    Wilkinson, I. T.
    Bailey, S.
    Choi, D.
    Flaxel, C. J.
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 2010, 51 (13)
  • [8] Electron interactions with C3F8
    Christophorou, LG
    Olthoff, JK
    JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1998, 27 (05) : 889 - 913
  • [9] Electron interactions with C3F8
    Christophorou, L.G.
    Olthoff, J.K.
    Journal of Physical and Chemical Reference Data, 27 (05): : 889 - 913
  • [10] Response analysis of electron attachment rates to C3F8 and SF6 in buffer gases
    Dahl, Dominik A.
    Franck, Christian M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (44)