Effect of copper concentration on the physical properties of ZnS:Cu alloys prepared by chemical bath deposition

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作者
Abdelhak Jrad
Wafa Naffouti
Chayma Nefzi
Tarek Ben Nasr
Souad Ammar
Najoua Turki-Kamoun
机构
[1] Université Tunis El Manar,LR99ES13 Laboratoire de Physique de la Matière Condensée (LPMC), Département de Physique, Faculté des Sciences de Tunis
[2] Université Paris Diderot,Sorbonne Paris Cité, ITODYS, CNRS, UMR
关键词
Chemical Bath Deposition; Hall Effect Measurement; Chemical Bath Deposition Method; Chemical Bath Deposition Technique; Effective Mass Ratio;
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摘要
ZnS:Cu thin films were deposited on glass substrates by chemical bath deposition technique. The structural, morphological, optical and electrical properties of the grown films were characterized by X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared spectrometry, scanning electron microscopy, spectrophotometry, spectrofluorimetry and Hall effect measurements. Both XRD and Raman analysis indicated the coexistence of both sphalerite ZnS and covellite CuS with cubic and hexagonal structures, respectively. The optical band gap of the films increased from 3.70 to 3.75 eV with Cu concentration increment. Photoluminescence studies revealed that the incorporation of Cu2+ ions in ZnS matrix blue shifted and quenched the emission bands. Electric resistivity, volume carrier concentration, surface carrier concentration and Hall mobility were determined from Hall effect measurements. Indeed, for pure sample, the obtained values were about 7.586 × 104 Ω cm, 1.472 × 1011 cm−3, 2.944 × 106 cm−2 and 5.590 × 102 cm2 V−1 s−1, respectively. However, after Cu incorporation, these values varied in the range of (2.273 × 104–13.80 × 104) Ω cm, (2.334 × 1011–9.094 × 1013) cm−3, (4.668 × 106–1.819 × 109) cm−2 and (3.092 × 10−1–1.937 × 102) cm2 V−1 s−1, respectively.
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页码:10684 / 10695
页数:11
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