Hydrogen gas sensitivity of thin films of tin oxide surface doped by platinum laser plasma of different structure and charge composition

被引:0
|
作者
Shatokhin A.N. [1 ]
Putilin F.N. [1 ]
Rumyantseva M.N. [2 ]
Gas'kov A.M. [2 ]
机构
[1] Division of Laser Chemistry, Moscow
[2] Division of Inorganic Chemistry, Moscow
关键词
Electric field; Laser plasma; Platinum; Resistive gas sensitivity; Thin films; Tin oxide;
D O I
10.3103/S0027131409060042
中图分类号
学科分类号
摘要
The effect of structure and charge composition of Pt laser plasma in the surface doping of SnO2 thin films on their resistive gas sensitivity towards hydrogen has been studied. The structure and charge composition of plasma varied depending on the value and polarity of the potential (UD) of the inhomogeneous electrostatic field generated between a target and plates of a diaphragm located in a vacuum chamber outside the plasma dispersion zone under the action of Kr-F laser radiation on a platinum target. Doping at UD > 0 results in an increase in gas sensitivity of SnO2 films several times greater than doping by quasineutral plasma (UD = 0). The films doped at UD < 0 with surface concentrations of Pt optimum in terms of the maximum gas sensitivity appear to tolerant towards changes in the composition of the gas phase in a temperature range of 50-600°C. © 2009 Allerton Press, Inc.
引用
收藏
页码:378 / 381
页数:3
相关论文
共 50 条
  • [1] EFFECT OF PLATINUM DISTRIBUTION ON THE HYDROGEN GAS SENSOR PROPERTIES IN TIN OXIDE THIN-FILMS
    SUZUKI, T
    YAMAZAKI, T
    TAKAHASHI, K
    YOKOI, T
    JOURNAL OF MATERIALS SCIENCE, 1989, 24 (06) : 2127 - 2131
  • [2] ANTIMONY DOPED TIN OXIDE THIN FILMS: CO GAS SENSOR
    Joshi, P. S.
    Jogade, S. M.
    Lohar, P. A.
    Sutrave, D. S.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2011, 3 (01) : 956 - 962
  • [3] THE DEGRADATION OF FLUORINE DOPED TIN OXIDE-FILMS IN A HYDROGEN PLASMA
    MAJOR, S
    BHATNAGAR, MC
    KUMAR, S
    CHOPRA, KL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2415 - 2420
  • [4] Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films
    Morales-Masis, M.
    Ding, L.
    Dauzou, F.
    Jeangros, Q.
    Hessler-Wyser, A.
    Nicolay, S.
    Ballif, C.
    APL MATERIALS, 2014, 2 (09):
  • [5] Laser plasma sintering for fabricating indium tin oxide thin films
    Park, Taesoon
    Kim, Dongsik
    THIN SOLID FILMS, 2016, 615 : 177 - 182
  • [6] Effects of gas flow rate on the structure and elemental composition of tin oxide thin films deposited by RF sputtering
    Al-Mansoori, Muntaser
    Al-Shaibani, Sahar
    Al-Jaeedi, Ahlam
    Lee, Jisung
    Choi, Daniel
    Hasoon, Falah S.
    AIP ADVANCES, 2017, 7 (12):
  • [7] Study on surface morphology of nanoscale structure of pure and zinc-doped tin oxide uniform thin films
    Rozati, S. M.
    Shadmani, E.
    SURFACE AND INTERFACE ANALYSIS, 2010, 42 (6-7) : 1160 - 1162
  • [8] Doped nano-phase tin oxide thin films for selective gas sensing
    Singhal, Akshay V.
    Chandra, Kamlesh
    Agarvvala, Vijaya
    INTERNATIONAL JOURNAL OF NANOTECHNOLOGY, 2015, 12 (3-4) : 248 - 262
  • [9] Structural And Gas Sensing Properties of Sprayed Antimony Doped Tin Oxide Thin Films
    Joshi, P. S.
    Sutrave, D. S.
    Jogade, S. M.
    Jamadar, B. N.
    16TH INTERNATIONAL WORKSHOP ON PHYSICS OF SEMICONDUCTOR DEVICES, 2012, 8549
  • [10] Tungsten-doped tin oxide thin films prepared by pulsed plasma deposition
    Huang, Yanwei
    Zhang, Qun
    Li, Guifeng
    Yang, Ming
    MATERIALS CHARACTERIZATION, 2009, 60 (05) : 415 - 419