Limiting Size of Monolayer Graphene Flakes Grown on Silicon Carbide or via Chemical Vapor Deposition on Different Substrates

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作者
N. I. Alekseev
机构
[1] St. Petersburg Electrotechnical University (LETI),
关键词
graphene; epitaxial growth; chemical vapor deposition (CVD); quantum chemistry; graphene synthesis on silicon carbide;
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摘要
The maximum size of homogeneous monolayer graphene flakes that form during the high-temperature evaporation of silicon from a surface of SiC or during graphene synthesis via chemical vapor deposition is estimated, based on the theoretical calculations developed in this work. Conditions conducive to the fragmentation of a monolayer graphene sheet to form discrete fragments or terrace-type structures in which excess energy due to dangling bonds at the edges is compensated for by the lack of internal stress are indentified and described. The results from calculations for the sizes of graphene structures are compared with experimental findings for the most successful graphene syntheses reported in the literature.
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页码:955 / 964
页数:9
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