Preparation of Nanostructured ZnO Thin Films Using Magnetron Sputtering for the Gas Sensors Applications

被引:0
|
作者
Mohammad Taghi Hosseinnejad
Marzieh Shirazi
Mahmood Ghoranneviss
Mohammad Reza Hantehzadeh
Elham Darabi
机构
[1] Islamic Azad University,Young Researchers and Elite Club, Science and Research Branch
[2] Islamic Azad University,Plasma Physics Research Center, Science and Research Branch
关键词
Magnetron sputtering; ZnO nano structures; XRD; AFM; Gas sensing;
D O I
暂无
中图分类号
学科分类号
摘要
ZnO is one of the most promising transparent conducting oxide materials, which widely used in thin film gas sensors. In this research, the dependence of the thermal oxidation time on structural, morphological and gas sensing properties of ZnO thin films is investigated. ZnO nanostructures are synthesized by using DC magnetron sputtering for deposition of pure zinc layers on glass substrates and then thermal oxidation of deposited zinc layers to produce zinc oxide (ZnO) thin films. Obtained results from X-ray diffraction revealed that the degree of crystallinity and the average grain size of the ZnO deposited thin films enhance with increasing the thermal oxidation time. Surface topography and growth behavior of ZnO thin films have important role in optimization of gas sensing properties of these films. In this study, scanning electron microscopy and atomic force microscopy have been used to investigate the effective parameters related to the surface topography of the films. Obtained results from these analyzes revealed that the surface topography of ZnO deposited samples strongly depend on thermal oxidation time. Also the effect of thermal oxidation time on the performance of ZnO gas sensors is investigated. The results indicated that the ethanol gas sensing properties of ZnO samples improve with decreasing the size of grains.
引用
收藏
页码:405 / 412
页数:7
相关论文
共 50 条
  • [1] Preparation of Nanostructured ZnO Thin Films Using Magnetron Sputtering for the Gas Sensors Applications
    Hosseinnejad, Mohammad Taghi
    Shirazi, Marzieh
    Ghoranneviss, Mahmood
    Hantehzadeh, Mohammad Reza
    Darabi, Elham
    JOURNAL OF INORGANIC AND ORGANOMETALLIC POLYMERS AND MATERIALS, 2016, 26 (02) : 405 - 412
  • [2] Recent Applications and Future Trends of Nanostructured Thin Films-Based Gas Sensors Produced by Magnetron Sputtering
    Moura, Pedro Catalao
    Serio, Susana
    COATINGS, 2024, 14 (09)
  • [3] Preparation and characterization studies of nanostructured silicon thin films using rf magnetron sputtering
    Detty, A. P.
    Vinodkumar, R.
    Navas, I.
    Pillai, V. P. Mahadevan
    INTERNATIONAL SEMINAR ON SCIENCE AND TECHNOLOGY OF GLASS MATERIALS (ISSTGM 2009), 2009, 2
  • [4] Preparation of ZnO thin films with different preferential orientations using RF magnetron sputtering
    Lu, Ye
    Li, Yong-Qiang
    Zhu, Xing-Wen
    Yadian Yu Shengguang/Piezoelectrics and Acoustooptics, 2007, 29 (02): : 204 - 206
  • [5] Preparation of ZnO thin film by magnetron sputtering
    Luan, Hexin
    Zhuang, Daming
    Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 2013, 34 (10): : 1729 - 1734
  • [6] ZnO thin films produced by magnetron sputtering
    Gao, W
    Li, ZW
    CERAMICS INTERNATIONAL, 2004, 30 (07) : 1155 - 1159
  • [7] Nanostructured TiCrN thin films by Pulsed Magnetron Sputtering for cutting tool applications
    Thampi, V. V. Anusha
    Bendavid, Avi
    Subramanian, B.
    CERAMICS INTERNATIONAL, 2016, 42 (08) : 9940 - 9948
  • [8] Preparation of Nanostructured SixN1−x Thin Films by DC Reactive Magnetron Sputtering for Tribology Applications
    Ahmed A. Anber
    Firas J. Kadhim
    Silicon, 2018, 10 : 821 - 824
  • [9] Preparation of Nanostructured SixN1-x Thin Films by DC Reactive Magnetron Sputtering for Tribology Applications
    Anber, Ahmed A.
    Kadhim, Firas J.
    SILICON, 2018, 10 (03) : 821 - 824
  • [10] Preparation and Properties of ZnO:Mo Thin Films Deposited by RF Magnetron Sputtering
    Ma, Jianhua
    Liang, Yan
    Zhu, Xiaojing
    Jiang, Jinchun
    Wang, Shanli
    Yao, Niangjuan
    Chu, Junhao
    SEVENTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2011, 7995