Ti-doped hematite thin films for efficient water splitting

被引：0
|
作者：
Timur Sh. Atabaev
Muhammad Ajmal
Nguyen Hoa Hong
Hyung-Kook Kim
Yoon-Hwae Hwang
机构：
[1] Pusan National University,Department of Nanomaterials Engineering
[2] University of Peshawar,Institute of Physics and Electronics
[3] Seoul National University,Department of Physics and Astronomy
来源：
Applied Physics A | 2015年 / 118卷
关键词：
Hematite; Water Splitting; Photocurrent Density; Thin Film Deposition; Fe2O3 Thin Film;
D O I：
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中图分类号：
学科分类号：
摘要：
Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.
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页码：1539 / 1542
页数：3
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