Analysis of correctness of intense ion beam diagnostics based on the ion-current density

被引:6
|
作者
Pushkarev, A. I. [1 ,2 ]
Isakova, Y. I. [1 ]
Khaylov, I. P. [1 ]
机构
[1] Tomsk Polytech Univ, Tomsk 634050, Russia
[2] Dalian Univ Technol, Sch Mat Sci & Engn, Surface Engn Lab, Dalian 116024, Peoples R China
关键词
MAGNETICALLY-INSULATED DIODE; ENERGY;
D O I
10.1134/S0020441215040090
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The results of a comparative analysis of the correctness of intense-ion-beam diagnostics, which is based on measurements of the ion-current-density and energy-density amplitudes, are presented. It is shown that when a nanosecond-duration pulsed ion beam is used to modify a surface, the main factor that determines changes in the properties of a treated item is a thermal effect rather than the ion implantation. The analysis of the influence of such factors as the ion-energy variation, the ion-beam composition, accelerated neutrals, the variation in the accelerating voltage, the diagnostics locality, and other factors on the accuracy of controlling the ion-beam impact on a target was performed. It was found that analyzing the stability of the thermal effect of an ion beam on the target on the basis of the amplitude of an ion-current density pulse yields an overestimated standard-deviation value. It was shown that measurements of the energy density provide more accurate and complete information that does not contain systematic errors.
引用
收藏
页码:667 / 674
页数:8
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