Efficient submicron processing of metals with femtosecond UV pulses

被引:0
|
作者
J. Békési
J.-H. Klein-Wiele
P. Simon
机构
[1] Laser Laboratorium Göttingen e.V.,
[2] Hans-Adolf-Krebs Weg 1,undefined
[3] 37 077 Göttingen,undefined
[4] Germany,undefined
来源
Applied Physics A | 2003年 / 76卷
关键词
PACS: 06.60.J; 61.80.B; 79.20D; 81.05B; 81.40;
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学科分类号
摘要
The generation of submicron-sized holes on metal surfaces by applying femtosecond UV laser pulses was investigated. Different optical schemes based on a Schwarzschild-type reflective objective were used to reach optimized ablation quality and efficiency in different applications (hole ablation, through-hole drilling, generation of surface patterns consisting of holes, etc.). Submicron-sized holes and hole patterns were ablated onto metal surfaces and drilled through ∼5-μm-thick steel foils with 600-nm diameter on the output side. Using a special optical interferometric method, large-area surface processing of high-conductivity materials in the submicron regime was performed. Combining these techniques with the application of high-repetition-rate ultra-short UV laser sources, large-area sub-μm processing of all kinds of materials in industrial environments is possible.
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页码:355 / 357
页数:2
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