Backscattering coefficients for low energy electrons and positrons impinging on metallic thin films: scaling study

被引:0
|
作者
A. Bentabet
N. E. Fenineche
机构
[1] Bordj-Bou-Arreridj University Center,Institute of Sciences and Technology
[2] UTBM University,LERMPS
来源
Applied Physics A | 2009年 / 97卷
关键词
68.37.-d; 68.37.Nq; 02.70.Uu; 61.14.Dc; 79.20.-m;
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摘要
Thin films Backscattering Coefficients (BSCs) for 1 to 4 keV electron and positron normally incident beams are stochastically modeled and calculated by the Monte Carlo method. We suggest a new function BSC(δ) depending only of one free parameter (to be determined) and which can describe very well the variation of the backscattering coefficient versus the film thickness (δ). Moreover, this paper aims at discussing the observed differences between the electron and positron properties impinging on solid targets.
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