X-ray absorption spectroscopy, simulation and modeling of Si-DLC films

被引:0
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作者
V. Palshin
R. C. Tittsworth
C. G. Fountzoulas
E. I. Meletis
机构
[1] Louisiana State University,Center for Advanced Microstructures and Devices
[2] APG,U.S. Army Research Laboratory, Materials Division
[3] Louisiana State University,Mechanical Engineering Department, Materials Science and Engineering Program
来源
关键词
Silicon Wafer; Phenyl Ring; Precursor Material; Edge Structure; Good Resemblance;
D O I
暂无
中图分类号
学科分类号
摘要
Amorphous silicon-containing diamond-like carbon (Si-DLC) films were deposited on silicon wafers by Ar+ Ion Beam Assisted Deposition (IBAD) at various energy conditions. The films were examined with X-ray Absorption Near Edge Structure (XANES) spectroscopy and Extended X-ray Absorption Fine Structure (EXAFS) spectroscopy. The Si K-edge X-ray Absorption Spectroscopy (XAS) results indicate that Si-DLC films have an amorphous structure, where each Si atom is coordinated to four carbon atoms or CHn groups. This short-range order, where a Si atom is surrounded by four C atoms, was found in all Si-DLC films. The XANES spectra do not indicate Si coordination to oxygen atoms or phenyl rings, which are present in the precursor material. A structural model of Si-DLC is proposed based on XAS findings. Simulated X-ray absorption spectra of the model produced by FEFF8 show a good resemblance to the experimental data.
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页码:1535 / 1539
页数:4
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