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- [5] Photosensitive polyimide based on poly(amic acid) and thermal imidization at 200 °C with photo-base generator ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2005, 229 : U1115 - U1115
- [7] Photosensitive polyimide-precursor-based on poly(amic-acid): Dimensionally stable polyimide with a low dielectric constant ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 216 : U135 - U135