Correction to: Electrochemical polishing versus mechanical polishing of AISI 304: surface and electrochemical study

被引：0
|
作者：
Ahmed M. Awad Abouelata
Adel Attia
Gehan I. Youssef
机构：
[1] National Research Centre,Department of Chemical Engineering and Pilot Plant, Engineering Research Division
[2] National Research Centre,Electrochemistry and Corrosion Laboratory, Physical, Chemistry Department
来源：
Journal of Solid State Electrochemistry | 2022年 / 26卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：131 / 131
相关论文
共 50 条
  • [1] Electrochemical polishing versus mechanical polishing of AISI 304: surface and electrochemical study (Oct, 10.1007/s10008-021-05037-2, 2021)
    Abouelata, Ahmed M. Awad
    Attia, Adel
    Youssef, Gehan I.
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2022, 26 (01) : 131 - 131
  • [2] The polishing mechanism of electrochemical mechanical polishing technology
    Lee, SJ
    Lee, YM
    Du, MF
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2003, 140 : 280 - 286
  • [3] Investigation of electrochemical behavior and polishing mechanism in electrochemical mechanical polishing of cobalt
    Xie, Fangjin
    Zhong, Min
    Xu, Wenhu
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2024, 169
  • [4] Effect of mechanical polishing on copper in electrochemical-mechanical polishing
    Shiu, Pei-Jiun R.
    Chen, Chao-Chang A.
    2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT), 2014, : 321 - 324
  • [5] Surface roughness evaluation of electrochemical mechanical polishing (ECMP)
    Toma, Yasushi
    Kodera, Akira
    Suzuki, Tsukuru
    Saitoh, Takayuki
    Hiyama, Hirokuni
    Kobata, Itsuki
    Wada, Yutaka
    Fukunaga, Akira
    Tsujimura, Manabu
    Advanced Metallization Conference 2006 (AMC 2006), 2007, : 565 - 570
  • [6] The technology combined electrochemical mechanical polishing
    Chen, YL
    Zhu, SM
    Lee, SJ
    Wang, JC
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2003, 140 : 203 - 205
  • [7] ELECTROCHEMICAL POLISHING
    EPELBOIN, I
    GARREAU, M
    GALVANOTECHNIK, 1978, 69 (06): : 494 - 501
  • [8] Study on electrochemical mechanical polishing process of copper circuit on PCB
    Nadiia Kulyk
    Chang Yong An
    Jung Hoon Oh
    Sung Min Cho
    Changsup Ryu
    Young Kwan Ko
    Chan-Hwa Chung
    Korean Journal of Chemical Engineering, 2010, 27 : 310 - 314
  • [9] Study on electrochemical mechanical polishing process of copper circuit on PCB
    Kulyk, Nadiia
    An, Chang Yong
    Oh, Jung Hoon
    Cho, Sung Min
    Ryu, Changsup
    Ko, Young Kwan
    Chung, Chan-Hwa
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2010, 27 (01) : 310 - 314
  • [10] Electrochemical characterization of copper chemical mechanical polishing
    Du, TB
    Tamboli, D
    Desai, V
    MICROELECTRONIC ENGINEERING, 2003, 69 (01) : 1 - 9
12345